首页> 外国专利> POSITIONING, FOCUSING AND MONITORING OF GAS PHASE SELECTIVE BEAM DEPOSITION

POSITIONING, FOCUSING AND MONITORING OF GAS PHASE SELECTIVE BEAM DEPOSITION

机译:气相选择性束沉积的定位,聚焦和监测

摘要

An apparatus for selectively depositing a layer of material from a gas phase to produce a part comprising a plurality of deposited layers. The apparatus includes a computer (50) controlling energy beam (46) (laser), to direct energy into a chamber containing the gas phase to produce photodecomposition or thermal decomposition of said phase and selectively deposit material within the boundaries of the cross-sectional regions of the part. For each cross section, the aim of the laser beam is scanned (48) over a target area (26) to deposit material within the boundaries of the cross section. Each subsequent layer is joined to the preceding layer to produce a part. The present invention further contemplates an n-degree of freedom positioning apparatus for positioning a target outer layer (42) and a detecting apparatus which can non-intrusively detect the position and thickness of the deposited layer, both of which are close looped into a computer to produce the desired part.
机译:一种用于选择性地从气相沉积材料层以产生包括多个沉积层的部件的设备。该设备包括控制能量束(46)(激光)的计算机(50),以将能量引导到包含气相的腔室中,以产生所述相的光分解或热分解,并选择性地将材料沉积在横截面区域的边界内部分。对于每个横截面,在目标区域(26)上扫描(48)激光束的目标,以将材料沉积在横截面的边界内。每个随后的层都连接到先前的层以产生零件。本发明还考虑了一种用于定位目标外层(42)的n自由度定位设备和一种能够非侵入式地检测沉积层的位置和厚度的检测设备,这两种设备都被闭环到计算机中。生产所需的零件。

著录项

  • 公开/公告号WO9216343A1

    专利类型

  • 公开/公告日1992-10-01

    原文格式PDF

  • 申请/专利号WO1992US02008

  • 发明设计人 MARCUS HARRIS L.;

    申请日1992-03-13

  • 分类号B23K26/04;B23K26/08;B29C67/00;C23C16/01;C23C16/04;C23C16/44;C23C16/52;

  • 国家 WO

  • 入库时间 2022-08-22 05:30:55

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