Novel poly(aryl ether sulfone)-poly(aryl ether ketone) block copolymers are described. They are prepared by the nucleophilic polycondensation of a hydroxy- or halo-terminated poly(aryl ether ketone) oligomer with the poly(aryl ether sulfone) forming reagents; alternatively, a preformed poly(aryl ether sulfone) block may be used. PPThe novel copolymers are tough materials with excellent heat, solvent, and stress-crack resistance. They display high HDT's (heat distortion temperatures) and are useful in molding, extrusion and composites applications.
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