首页> 外国专利> Low frequency plasma spray method in which a stable plasma is created by operating a spray gun at less than 1 MHz in a mixture of argon and helium gas

Low frequency plasma spray method in which a stable plasma is created by operating a spray gun at less than 1 MHz in a mixture of argon and helium gas

机译:低频等离子喷涂方法,其中通过在小于1 MHz的氩气和氦气混合物中操作喷枪来产生稳定的等离子体

摘要

A low frequency RF plasma spray deposition method is provided, which is especially effective in reducing losses and improving particle heating. In one aspect of the invention, an RF plasma gun is operated in the frequency range below 1 MHz and an argon-helium mixture to which a third component, such as hydrogen, can also be admixed, is substituted for the standard argon-hydrogen mixture used at frequencies above 2 MHz. In another aspect of the invention, a RF plasma gun is operated in the frequency range of 400-500 kHz and specific start up and operating procedures and conditions are set forth for successful deposition of titanium and refractory metal alloys.
机译:提供了一种低频RF等离子体喷涂沉积方法,该方法在减少损耗和改善颗粒加热方面特别有效。在本发明的一个方面,RF等离子体枪在低于1MHz的频率范围内操作,并且还可以混合有第三组分例如氢的氩-氦混合物来代替标准的氩-氢混合物。用于2 MHz以上的频率。在本发明的另一方面,RF等离子枪在400-500kHz的频率范围内操作,并且提出了用于成功沉积钛和难熔金属合金的具体启动和操作程序和条件。

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