PRODUCING METHOD FOR STANDARD SAMPLE FOR CALIBRATING MEASURED DISPLACEMENT, STANDARD SAMPLE AND MEASURING DEVICE AND CALIBRATING METHOD

摘要

PURPOSE: To obtain a standard sample for exactly calibrating the roughness in angstroms to tens angstrom by etching with exactly controlling the etching grade of pattern difference in level using an etching agent with very slow etching speed. ;CONSTITUTION: For smoothing a material surface, a material, silicone wafer 101 for example, is oxidized pyrogenically to form a pseudo oxidation film 102. By dipping in buffered fluoric acid added with a surface active agent, the pseudo oxidation film 102 is removed to obtain a silicone wafer 103. With dry oxigen to make difference in level, a thermal oxidation film 104 is grown. As an etching mask to make the pattern of difference in level 107, a pattern mask 105 is added with a resist. The initial thickness of the oxidation film 104 is measured. After etching an oxidation film, it becomes an oxidation film 108 with difference in level. If the desired difference in level is small, the etching agent is adjusted one with low etching speed. After measuring the oxidation film 109 and eliminating the resist, a standard sample 110 is obtained.;COPYRIGHT: (C)1993,JPO&Japio