METHOD FOR DOPING BASE MATERIAL WITH DOPING MATERIAL FOR PRODUCING COMPOUND OR ALLOY IN USE OF SPUTTERING CATHODE AND DEVICE FOR PERFORMING THIS METHOD

摘要

PURPOSE: To provide a method, in the use of a sputtering cathode working in a magnetron mode, for forming a compound and an alloy on a substrate as coating, furthermore for doping a base material and moreover for producing this coating advantageously from the viewpoint of cost. ;CONSTITUTION: A target is composed of plural parts 37 and 38, the center target 37 is composed of a doping material, and the outside target 38 is composed of a base material. The magnet arrayed body of a sputtering cathode 23 is composed of a center magnet unit 29 capable of positioning and magnet units 25, 26, 27 and 28 having fixed positions and surrounding the center magnet unit 29, by which, as to the target parts 37 and 38, sputtering is made possible by respectively using the specially selected magnetic fields, different materials can be sputtered at different rates, and optional doping is made possible.;COPYRIGHT: (C)1993,JPO