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QUANTUM-WIRE STRUCTURE ELEMENT

机译:量子线结构元素

摘要

PURPOSE: To obtain a quantum-wire structure element having a structure wherein a quantum wire is produced without being changed by the purity of a GaAs film, by constructing the element so that a potential in relation to a conduction band electron be the minimum at a position in the central part of a well layer. ;CONSTITUTION: Carriers in the vertical direction are confined by using a double heterostructure which is formed by holding a semiconductor well layer 11 from the opposite surfaces by P-or N-type semiconductor barrier layers 12. On the other hand, carriers in the horizontal direction are confined by a construction wherein the opposite lateral sides of the double heterostructure are held by P-or N-type semiconductor barrier layers 13 between. Electrons supplied from the barrier layers 12 are accumulated on interfaces on the well side between the barrier layers 12 and the well layer 11 and a two-dimensional electron gas is formed. Besides, a potential in the horizontal direction becomes minimum in relation to conduction band electrons in the vicinity of the central parts of the well layer 11 and the barrier layers 12. According to this constitution, a quantum wire structure element having a structure wherein a quantum thin wire is produced without being changed by the purity of a GaAs film can be obtained.;COPYRIGHT: (C)1993,JPO&Japio
机译:目的:获得一种量子线结构元件,其结构是通过制造一种量子线而不会因GaAs膜的纯度而改变量子线,该元件应使相对于导带电子的电势在a处最小。位置位于井层的中央。 ;构成:垂直方向上的载流子是通过使用双重异质结构来限制的,该异质结构是通过P或N型半导体势垒层12从相对的表面保持半导体阱层11而形成的。方向由其中双异质结构的相对侧面由P-或N-型半导体阻挡层13保持在其间的构造限制。从势垒层12提供的电子累积在势垒层12和阱层11之间的阱侧的界面上,并且形成二维电子气。此外,相对于阱层11和势垒层12的中心部分附近的导带电子,水平方向上的电势变得最小。根据该构造,量子线结构元件具有其中量子点的结构。无需改变GaAs薄膜的纯度即可生产出细丝。版权所有:(C)1993,日本特许会计师事务所

著录项

  • 公开/公告号JPH0590712A

    专利类型

  • 公开/公告日1993-04-09

    原文格式PDF

  • 申请/专利权人 OLYMPUS OPTICAL CO LTD;

    申请/专利号JP19910248937

  • 发明设计人 MENDA KAZUNORI;

    申请日1991-09-27

  • 分类号H01S3/18;G02F1/35;H01L29/06;H01L33/00;

  • 国家 JP

  • 入库时间 2022-08-22 05:12:51

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