system for the investigation of patterns.

摘要

An improved pattern inspection system for automatically inspecting patterns on a printed circuit board, a semiconductor chip, etc. The pattern inspection system includes an optical sensor (20), a binary conversion circuit (17), a memory (18) storing binary converted data in a matrix form, a length measurement circuit (11), a reference circuit (13) and a determination circuit (12). The length measurement circuit includes a gate unit for picking-up the binary converted data array from the memory in radial directions with respect to an origin and in a predetermined length in each direction, a unit for measuring radii of the pattern in the radial directions from the origin in response to the picked-up binary converted data; a unit for determining a center line of the pattern in the picked-up binary converted data array by the measured length of the first directions, and a unit for encoding the measured length of the second directions to numerals each corresponding to one length of each of the second directions. The reference circuit receives the coded numerals for a reference pattern and forms a coded reference in response to the coded numerals. The determination circuit receives coded numerals for a inspection pattern, compares a code in response to the received coded numerals with the coded reference in the reference circuit, and determines a fault in the inspection pattern.