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Pressure pulse source for lithotripsy - has pulsed diaphragm in acoustic medium with layer of lower acoustic impedance

机译:碎石术的压力脉冲源-在声学介质中具有脉冲膜片,具有较低的声阻抗层

摘要

The pressure pulse source employs a pulsed diaphragm (11) in an acoustic medium (21) and a layer (20) between the diaphragm and medium whose (20) acoustic impedance is lower than that of the medium and which borders directly on the diaphragm. The thickness (d) of this layer (20) or the distance between the layer-adjoining boundary surface between two layers of differing impedance and the diaphragm is one quarter wavelength of the fundamental wavelength of the pulse produced in this same layer (20). One of the layers adjacent to layer is in foam form, with low impedance medium held in the foam pores. USE/ADVANTAGE - Non-invasive surgery, lithotripsy, materials testing etc. Low impedance layer(s) between diaphragm and medium maximises pulse energy content and pressure effect.
机译:压力脉冲源在声介质(21)中使用脉冲膜片(11),并且在膜片和介质之间的层(20)的声阻抗(20)低于介质的声阻抗,并且直接邻接于膜片。该层(20)的厚度(d)或具有不同阻抗的两层之间的层邻接边界表面与隔膜之间的距离是在该相同层(20)中产生的脉冲的基本波长的四分之一波长。与该层相邻的一层是泡沫形式的,在泡沫孔中保持着低阻抗介质。使用/优点-非侵入性手术,碎石术,材料测试等。隔膜和介质之间的低阻抗层可最大程度地提高脉冲能量含量和压力效果。

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