Radiation source esp. for radiation-induced etching and CVD installations - comprises adjustable spectrum obtd. by system parameter variation

摘要

The radiation source is used, in partic., for radiation-induced etching and CVD installations comprising a dielectric container for gas or gas mixt. (7), a vacuum process chamber (1), a device (10) for microwave application, and magnets (12) surrounding the container sidewall and producing a toroidal magnetic field (14). An electron-cyclotron resonance of the microwave field in the container is excited by this magnetic field. The container (2) is closed and pref. O, N, Hg or an inert gas (7) may be introduced into the container via an inlet and sealing ring (6). The energy spectrum of (pref. photon) radiation entering into the process chamber (1) from the container is adjustable, e.g., by variation of the gas mixt., the applied electromagnetic waves (pref. microwaves) and the magnetic field (14). The container (3) pref. is made up of a circular plane disc (3) and a dome (5). It is pref. made of quartz. A gas inlet and sealing ring (6) may be inserted between the disc and the dome. Entry of gas into the interior of the container takes place via a device which is integrated pref. with the sealing ring (6). The spatial power distribution is adjustable by combined variation of the gas pressure and microwave radiation. USE/ADVANTAGE - Used in etching and CVD installations. C.f. prior radiation sources (which have a narrow, constant spectrum), it has a wide radiation spectrum which may be adjusted by parameter variation.