首页> 外国专利> 1,3-Di:sila cyclobutane(s) for silicon carbide prods. - mfd. by pyrolysing alkoxy tri:sila alkane(s) at 400-800 deg. C. at atmos. pressure or vacuum, avoiding alkali metal, for high yield and purity

1,3-Di:sila cyclobutane(s) for silicon carbide prods. - mfd. by pyrolysing alkoxy tri:sila alkane(s) at 400-800 deg. C. at atmos. pressure or vacuum, avoiding alkali metal, for high yield and purity

机译:1,3-Di:sila环丁烷(碳化硅产品)。 -MFD。通过在400-800℃下热解烷氧基三:sila烷烃。 C. atmos。压力或真空下,避免使用碱金属,可实现高收率和纯度

摘要

1,3-disilacyclobutanes are of formula (I); and R1-R4 = Me, OMe, OEt or Ph. Prodn. comprises pyrolysis of alkoxy-trisila-alkane derivs. of formula (II) (with R5 as for other R gps.) at 400-800 deg. C at atmos. pressure or under vacuum. Pref. (I) have R1 = R4 = Me and R2 = R3 = OMe, or R1-R3 = OMe and R4 = Me, or R1-R4 = OMe, or R1 = OMe, R2 = R3 = Cl and R4 = Me, or R1 = R4 = OMe and R2 = R3 = Cl, or R1 = R4 = OEt and R2 = R3 = Cl. Pref. (II) are obtd., e.g. by reacting chloromethylsilanes of formula R1R2R3SiCH2Cl with Si in the presence of Cu catalysts, as described in Korean Pat. Appl. No. 91-1055, and reacting with R4MgCl and/or with an alcohol R5OH. USE/ADVANTAGE - Prod. mixts. can be sepd. by distn..
机译:1,3-二硅环丁烷具有式(I);和R1-R4 = Me,OMe,OEt或Ph.Prodn。包括热解烷氧基-三硅烷基-烷烃衍生物。式(II)的化合物(在R5为其他R gps时)在400-800℃。 C at atmos。压力或真空下。首选(I)具有R1 = R4 = Me和R2 = R3 = OMe,或R1-R3 = OMe且R4 = Me,或R1-R4 = OMe,或R1 = OMe,R2 = R3 = Cl和R4 = Me,或R1 = R4 = OMe且R2 = R3 = Cl,或R1 = R4 = OEt且R2 = R3 = Cl。首选(II)已取消,例如如韩国专利No.5,200,380所述,通过在铜催化剂的存在下使式R 1 R 2 R 3 SiCH 2 Cl的氯甲基硅烷与Si反应。应用编号91-1055,并与R4MgCl和/或与醇R5OH反应。使用/优势-产品。混音。可以分隔按距离

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