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Process for producing a high emittance coating and resulting article

机译:生产高发射率涂层的方法和所得制品

摘要

Process for anodizing aluminum or its alloys to obtain a surface particularly having high infrared emittance by anodizing an aluminum or aluminum alloy substrate surface in an aqueous sulfuric acid solution at elevated temperature and by a step-wise current density procedure, followed by sealing the resulting anodized surface. In a preferred embodiment the aluminum or aluminum alloy substrate is first alkaline cleaned and then chemically brightened in an acid bath The resulting cleaned substrate is anodized in a 15% by weight sulfuric acid bath maintained at a temperature of 30° C. Anodizing is carried out by a step-wise current density procedure at 19 amperes per square ft. (ASF) for 20 minutes, 15 ASF for 20 minutes and 10 ASF for 20 minutes. After anodizing the sample is sealed by immersion in water at 200° F. and then air dried. The resulting coating has a high infrared emissivity of about 0.92 and a solar absorptivity of about 0.2, for a 5657 aluminum alloy, and a relatively thick anodic coating of about 1 mil.
机译:通过在升高的硫酸水溶液中对铝或铝合金基材表面进行阳极氧化并通过逐步电流密度法对铝或其合金进行阳极氧化以获得特别具有高红外发射率的表面的方法,然后将所得的阳极氧化材料密封表面。在一个优选的实施方案中,首先对铝或铝合金基材进行碱清洁,然后在酸浴中进行化学增白。将所得清洁后的基材在保持在30°C的温度下的15%重量的硫酸浴中进行阳极氧化。通过逐步的电流密度程序,在20分钟内分别以19安培/平方英尺(ASF)进行20分钟,15 ASF进行20分钟和10 ASF进行20分钟。阳极氧化后,将样品浸入200°F的水中进行密封,然后风干。对于5657铝合金,所得涂层具有约0.92的高红外发射率和约0.2的太阳吸收率,以及约1密耳的相对较厚的阳极涂层。

著录项

  • 公开/公告号US5217600A

    专利类型

  • 公开/公告日1993-06-08

    原文格式PDF

  • 申请/专利权人 MCDONNELL DOUGLAS CORPORATION;

    申请/专利号US19920876768

  • 发明设计人 DUDLEY L. OBRIEN;HUONG G. LE;

    申请日1992-05-01

  • 分类号C25D11/06;

  • 国家 US

  • 入库时间 2022-08-22 04:58:16

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