首页> 外国专利> Injection of electrons with predominantly perpendicular energy into an area of toroidal field ripple in a tokamak plasma to improve plasma confinement

Injection of electrons with predominantly perpendicular energy into an area of toroidal field ripple in a tokamak plasma to improve plasma confinement

机译:将具有主要垂直能量的电子注入托卡马克等离子体中的环形场纹波区域,以改善等离子体的约束

摘要

An electron injection scheme for controlling transport in a tokamak plasma. Electrons with predominantly perpendicular energy are injected into a ripple field region created by a group of localized poloidal field bending magnets. The trapped electrons then grad-B drift vertically toward the plasma interior until they are detrapped, charging the plasma negative. Calculations indicate that the highly perpendicular velocity electrons can remain stable against kinetic instabilities in the regime of interest for tokamak experiments. The penetration distance can be controlled by controlling the "ripple mirror ratio", the energy of the injected electrons, and their v.sub. /v.sub.51 ratio. In this scheme, the poloidal torque due to the injected radial current is taken by the magnets and not by the plasma. Injection is accomplished by the flat cathode containing an ECH cavity to pump electrons to high v.sub.. perp..
机译:电子注入方案,用于控制托卡马克等离子体中的传输。具有主要垂直能量的电子被注入到由一组局部极向场弯曲磁体产生的波纹场区域中。被俘获的电子然后grad-B垂直向等离子体内部漂移,直到被俘获,从而使等离子体带负电。计算表明,在托卡马克实验所关注的方案中,高垂直速度的电子可以稳定地抵抗动力学的不稳定性。可以通过控制“波纹镜比”,注入的电子的能量以及它们的v来控制穿透距离。 /v.sub.51比率。在该方案中,由于注入的径向电流而产生的极向转矩由磁体而不是等离子体吸收。通过包含ECH腔的平坦阴极将电子泵浦到高v.sub。perp。,可以完成注入。

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