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Evaporation thing adhesion prevention device null to the non evaporation aspect in physical evaporation treatment

机译:物理蒸发处理中的蒸发物附着防止装置在非蒸发方面无效

摘要

PURPOSE:To prevent the vapor deposition on one surface not to be vapor-deposited and to recover an ineffective vapor-deposited material by passing an endless belt through a vapor deposition region while bringing the belt into close contact with the one surface not to be vapor-deposited when a metal is vapor-deposited on the other surface of a strip metal by physical vapor deposition (PVD). CONSTITUTION:A strip metal 3 such as a silicon steel sheet is traveled above a vapor deposition source 2 consisting of a vapor deposition metal such as Al and Ti in the direction as shown by the arrow A in a vacuum deposition chamber 1, and the vapor of Al, Ti, etc., from the vapor deposition source 2 is deposited on the surface 3a. At this time, the endless belt 4 is traveled by auxiliary rolls 5a, 5b, and 5c at the same speed as the strip metal in the direction as shown by the arrow B while bringing the belt into close contact with the rear surface of the strip metal 3 to be vapor- deposited. The vapor deposition metal is not deposited on the rear surface of the strip metal 3 because of the presence of the endless belt 4, and the metal deposited on the endless belt 4 is scraped off by scrapers 6a and 6b and efficiently recovered in recovery boxes 7a and 7b.
机译:目的:通过使环形带穿过一个气相沉积区域,同时使皮带与一个表面紧密接触,以防止一个表面上的蒸汽沉积不被沉积,并回收无效的蒸汽沉积材料,从而使该带与一个表面紧密接触而不蒸发。当通过物理气相沉积(PVD)将金属气相沉积在带状金属的另一表面上时,进行沉积。组成:诸如硅钢片之类的带状金属3在真空沉积室1中沿箭头A所示的方向在由铝和Ti等气相沉积金属组成的气相沉积源2上方移动来自气相沉积源2的Al,Ti等的Al被沉积在表面3a上。此时,环形带4通过辅助辊5a,5b和5c以与带金属相同的速度沿箭头B所示的方向行进,同时使带与带的后表面紧密接触。待蒸镀的金属3。由于存在环形带4,所以气相沉积金属不沉积在带状金属3的背面上,并且沉积在环形带4上的金属被刮具6a和6b刮除,并有效地回收到回收箱7a中。和7b。

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