首页> 外国专利> INSULATING FILM FOR SILICON STEEL SHEET EXCELLENT IN RUSTING RESISTANCE AFTER STRESS RELIEVING ANNEALING

INSULATING FILM FOR SILICON STEEL SHEET EXCELLENT IN RUSTING RESISTANCE AFTER STRESS RELIEVING ANNEALING

机译:在应力消除退火后,为硅钢片绝缘膜具有出色的抗腐蚀性

摘要

PURPOSE: To obtain an insulatiang film for a silicon steel sheet in which the generation of rusting is securely prevented after stress relieving annealing even if box annealing is adopted and film performance required for the insulating film is also good. ;CONSTITUTION: This insulating film for a silicon steel sheet excellent in rusting resistance after stress relieving annealing is formed by applying and baking a treating soln. contg. magnesium hydroxide and/or easily soluble aluminum hydroxide, water emulsion resin (e.g. acrylic monomer-styrene copolymer resin), boric acid and an organic reducing agent (e.g. glycol and dicarboxylic acid) and is subjected to stress relieving annealing. And in the film, chromium present on the topmost surface layer on the outer face of the film consists of hexavalent chromium in the measurement by an X-ray photoelectric spectrochemical method after the stress relieving annealing.;COPYRIGHT: (C)1994,JPO&Japio
机译:目的:获得一种用于硅钢板的绝缘膜,其中即使采用箱式退火,在应力消除退火之后也可以可靠地防止生锈的发生,并且绝缘膜所需的膜性能也良好。 ;组成:该硅钢片绝缘膜在应力消除退火后具有优异的耐锈性,是通过施加并烘烤处理液形成的。续氢氧化镁和/或易溶的氢氧化铝,水乳液树脂(例如丙烯酸单体-苯乙烯共聚物树脂),硼酸和有机还原剂(例如乙二醇和二羧酸)进行应力消除退火。并且在该膜中,在该膜的外表面上最表面层上存在的铬在应力消除退火后通过X射线光电光谱法测量时由六价铬组成。;版权所有:(C)1994,JPO&Japio

著录项

  • 公开/公告号JPH0610149A

    专利类型

  • 公开/公告日1994-01-18

    原文格式PDF

  • 申请/专利权人 SUMITOMO METAL IND LTD;

    申请/专利号JP19920167952

  • 发明设计人 NAKAYAMA TAISEI;

    申请日1992-06-25

  • 分类号C23C22/00;H01F1/18;H01F27/24;

  • 国家 JP

  • 入库时间 2022-08-22 04:53:17

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