FABRICATION OF SIC MIRROR FOR REFLECTING RADIOACTIVE RAY AND X-RAY

摘要

PURPOSE: To provide an SiC mirror for reflecting radioactive ray and X-rays having long service life in which exfoliation/deformation of SiC film and occurrence of pinhole are retarded and possibility of lowering ambient vacuum during operation is lowered significantly. ;CONSTITUTION: Ultrafine powder of SiC having purity of 99% or above, particle size of 0.01-0.2μm, and surface area of 30m²/g is placed in a carbon mold without adding any sintering accelerator. It is then sintered in an inert atmosphere at a temperature of 1900-2200°C while applying pressure of 50kg/cm² or above thus producing a sintered SiC base material. An SiC film is then formed by CVD on the surface of the sintered SiC base material and subjected to mirror polishing.;COPYRIGHT: (C)1994,JPO