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MANUFACTURE OF BRAZED SIC DIFFRACTION GRATING

机译:钎焊SIC衍射光栅的制造

摘要

PURPOSE: To directly cut the groove of a brazed diffraction grating having an accurate saw tooth cross section into an SiC substrate. ;CONSTITUTION: After forming the mask of a diffraction grating pattern of a resist material on the surface of an SiC substrate, reactive ion beam etching is performed from an oblique direction by using a mixed gas prepared by mixing CBrF3 and Ar so that they can satisfy a relation expressed by Ar/(CBrF3+ Ar)=50 to 95%. Therefore, the groove of the diffraction grating pattern can be directly cut into the SiC substrate, because the etching speed of the SiC is equal to or higher than that of the resist.;COPYRIGHT: (C)1994,JPO&Japio
机译:目的:将具有精确锯齿形横截面的钎焊衍射光栅的凹槽直接切成SiC衬底。 ;组成:在SiC衬底的表面上形成抗蚀剂材料的衍射光栅图案的掩模之后,通过使用通过混合CBrF 3 和Ar,以使其满足由Ar /(CBrF 3 + Ar)= 50至95%表示的关系。因此,由于SiC的蚀刻速度等于或高于抗蚀剂的蚀刻速度,因此可以将衍射光栅图案的凹槽直接切入SiC衬底.COPYRIGHT:(C)1994,JPO&Japio

著录项

  • 公开/公告号JPH06244154A

    专利类型

  • 公开/公告日1994-09-02

    原文格式PDF

  • 申请/专利权人 SHIMADZU CORP;

    申请/专利号JP19930026739

  • 发明设计人 KOEDA MASARU;

    申请日1993-02-16

  • 分类号H01L21/302;G02B5/18;

  • 国家 JP

  • 入库时间 2022-08-22 04:49:47

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