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Method for measuring temperature based on infrared light and apparatus for measuring temperature based on infrared light

机译:基于红外光的温度测量方法及基于红外光的温度测量装置

摘要

A method for measuring temperature based on infrared light which measures the temperature of a semiconductor element, the surface layer of which is formed with two kinds of materials having different emissivities and optical reflectances, based on the amount of infrared emission incident on an image taking means according to the invention, comprises the steps of taking an image by diffusing and letting the incident be the reflected light of a beam of light incident on the surface of the above semiconductor element on the light receiving face of the image taking means, followed by determining the area ratio at which each of the above two kinds of materials occupies the surface of the above semiconductor element by comparing the average brightness value of the above image with the brightness value of an image for the case that each of the above two kinds of materials independently forms the surface layer of the above semiconductor element, and obtaining the weighted average of the emissivities of the above two kinds of materials with the area ratio at which each of the above two kinds of materials occupies the surface of the above semiconductor element, followed by calculating the temperature of the above semiconductor element based on the weighted average and the actual amount of infrared emission. IMAGE
机译:一种基于红外光的温度测量方法,该方法基于入射在图像拍摄装置上的红外发射量来测量半导体元件的温度,该半导体元件的表面层由具有不同发射率和光反射率的两种材料形成。根据本发明,包括以下步骤:通过扩散并使入射的光束为入射在图像拍摄装置的光接收面上的上述半导体元件的表面上的光束的反射光,然后确定通过将上述图像的平均亮度值与上述两种材料中每种材料的情况下图像的亮度值进行比较,上述两种材料中的每种材料占据上述半导体元件表面的面积比独立形成上述半导体元件的表面层,并获得发射率的加权平均值将上述两种材料的各自以上述两种材料各自占据上述半导体元件的表面的面积比进行计算,然后基于加权平均值和实际量来计算上述半导体元件的温度红外发射。 <图像>

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