首页> 外国专利> COMPLEMENTARY BIPOLAR TRANSISTORS HAVING HIGH EARLY VOLTAGE, HIGH FREQUENCY PERFORMANCE AND HIGH BREAKDOWN VOLTAGE CHARACTERISTICS AND METHOD OF MAKING SAME

COMPLEMENTARY BIPOLAR TRANSISTORS HAVING HIGH EARLY VOLTAGE, HIGH FREQUENCY PERFORMANCE AND HIGH BREAKDOWN VOLTAGE CHARACTERISTICS AND METHOD OF MAKING SAME

机译:具有较高的早期电压,较高的频率性能和较高的击穿电压特性的互补双极晶体管及其制造方法

摘要

The invention relates to complementary bipolar transistors and to a method for fabricating such transistors on a dielectrically insulated substrate. Both NPN and PNP regions include an emitter (74, 80) which is diffused from an emitter polysilicon contact (68A, 68B) and an extrinsic base (52, 56) which is diffused. made from a base polysilicon contact (40, 42), the emitter polysilicon contact being separated from the base polysilicon contact by an oxide / nitride side wall. It is thus possible to obtain flat emitters and a short distance between the emitters and the extrinsic bases, as well as high performance.
机译:本发明涉及互补双极晶体管以及在介电绝缘衬底上制造这种晶体管的方法。 NPN和PNP区域都包括从发射极多晶硅触点(68A,68B)扩散的发射极(74、80)和扩散的非本征基极(52、56)。由基础多晶硅触点(40、42)制成,发射极多晶硅触点通过氧化物/氮化物侧壁与基础多晶硅触点分离。因此,可以获得平坦的发射器以及发射器与非本征基极之间的短距离以及高性能。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号