Microwave-assisted sputtering appts. - comprises vacuum chamber, target, magnetic appts., microwave, and electromagnet

摘要

Microwave-assisted sputtering appts. comprises: (a) a vacuum chamber (1); (b) a target (7) in the vacuum chamber (1), connected to an electrode (8), which is connected to a current supply (6); (c) a magnetic appts. (14,15,16), whose magnetic field (31,32) exits the target (7) and then re-enters it; (d) a microwave (50), which is led into the target region; and (e) an electromagnet (21,22) around the target. The microwave (50) is injected into 2 sepd. hollow resonators (25,26) before the target (7). A 1st hollow conductor (25) and a 2nd hollow conductor (17) are provided, between which is located a microwave-permeable disc (29). USE/ADVANTAGE - For applying thin layers to substrates, e.g. glass. To enlarge the working area of magnetron cathode discharges to discharge voltages and/or working pressures.