Controlling the reaction ratio during coating process - in which the partial pressure of the gas is adjusted by alteration of the evapn. rate of a solid reacting with the gas etc.

摘要

In the control of the ratio gamma = x/y during prodn. of a coating FxGy by a plasma-aided reactive pptn. process at least a part of a solid F is cathode sputtered in a vacuum atmos. with a gas or a gas mixt. G, while the partial pressure of the gas or the gas mixture G is used as a control variable. The partial pressure is adjusted by alteration of the rate of evapn. of a solid reacting with the gas or the gas mixture. The coating installation with a gas inlet system (25) is additionally provided with an evaporation source (35) with a rate setting input (ERu). USE/ADVANTAGE - Prodn. of surface coatings by means of a plasma-aided reactive pptn. process. In comparison with known methods, control can be stabilised considerably more easier over the entire process duration.