Positive light-sensitive compsn. contg. development inhibitor - contg. widely spaced gps. pref. tert.-alkyl gps. decomposed by acid and alkali-soluble gps., water-insol., alkali-soluble resin and photo-acid

摘要

Positive light-sensitive compsn. contains a low-mol. cpd. (I) with mol. wt. = max. 3000, which inhibits dissolution is decomposed by acid and becomes more soluble in an alkaline developer soln. on reaction with acid. The compsn. also contains a water-insol. resin (II), which is soluble in aq. alkali soln. and a photo-acid (III). (I) contains at least 3 gps. (IA) decomposed by acid, with at least 9 binding atoms between the most widely spaced (IA), and at least 10 mole-% alkali-soluble gps. (IB). Pref. (I) has mol. wt. 1000-2500; has at least 10, pref. at least 11 binding atoms, between the most widely spaced (IA). (IA) pref. are tert. alkyl ester gps. (IC). USE/ADVANTAGE - The compsn. is useful for making lithographic printing plates and semiconductors (e.g. ICs, LCDs and thermal heads) and in other photofabrication processes. The compsn. has high sensitivity, high resolution, and good profile and excellent storage stability.