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Fluorescent substance excited by low velocity electrons - is formed by shallow activator-doping of crystalline matrix

机译:低速电子激发的荧光物质-由晶体基质的浅层活化剂掺杂形成

摘要

A novel fluorescent substance, excited by low velocity electrons, comprises a crystalline matrix and a luminescence-promoting activator which is doped in only a portion of the matrix extending to a depth of 0.5 microns from the matrix surface. Prodn. of the above substance involves (i) doping the activator into the crystalline matrix by ion implantation at an implantation energy of max. 100 keV; and (ii) annealing for max. 30 mins. USEU} In fluorescent display devices. ADVANTAGEU} The substance has increased luminance and is produced with increased yield and in a short time without deterioration of the surface of the crystalline matrix used to form the substance. PREFERRED PROCESSU} Ion implantation is carried out in an intermittent manner, the crystalline matrix being cooled during interruption of implantation. EMBODIMENTU} The fig. shows the relationship between relative luminance and implantation energy for a prior art substance and a Mn-doped ZnGa2O4 substance according to the invention. ZnGa2O4 powder (crystalline matrix) is doped with Mn at a dosage of 1 * 10 power 15 - 1 * 10 power 17/sq.cm. (corresponding to 0.03-3%) at an implantation energy of 10-100 (pref. 50) keV and an ion current of 1-100 (pref. 10) micro-A and is then annealed under the conditions: heating-up rate 100 deg C/sec., annealing temp. 600-1000 deg C, annealing time 10 secs. to 30 mins. and an annealing atmos. of a vacuum of 0.001 Pa. @GRAPHIC = O:EDNAIMAGES9431FR2698878.A1PG000001.DRG,562,426,0
机译:一种由低速电子激发的新型荧光物质,包括晶体基质和发光促进活化剂,该活化剂仅掺杂在从基质表面延伸到0.5微米深度的部分基质中。产品上述物质的制备涉及(i)以最大注入能量通过离子注入将活化剂掺杂到晶体基质中。 100 keV; (ii)进行最大退火。 30分钟USEU}在荧光显示设备中。优点}该物质具有增加的亮度,并以提高的产率和在短时间内生产而不会降低用于形成该物质的结晶基质的表面。优选的方法离子注入以间歇方式进行,在注入中断期间将晶体基质冷却。具体实施方式图1示出了现有技术的物质和根据本发明的Mn掺杂的ZnGa 2 O 4物质的相对亮度和注入能量之间的关系。 ZnGa2O4粉末(晶体基质)掺有Mn的剂量为1×10功率<15>-1×10功率<17> /sq.cm。 (对应于0.03-3%)在10-100 kev(pref。50)keV的注入能量和1-100(pref。10)micro-A的离子电流下,然后在以下条件下退火:升温速率100℃/秒,退火温度600-1000摄氏度,退火时间10秒。至30分钟。和退火气氛。 0.001 Pa的真空度@GRAPHIC = O: EDNA IMAGES 9431 FR 2698878.A1 PG000001.DRG,562,426,0

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