A pyrophoric gas neutralization chamber is disclosed. The chamber can be used to neutralize a stream of spent process gas from, for example, a chemical vapor deposition process containing, for example, silane. The disclosed chamber is a multi-tiered structure which provides a turbulent flow of air and gas which provides for a controlled neutralization reaction. The chamber operates over a wide range of incoming pyrophoric gas flows to neutralize virtually all of the pyrophoric gas, such that the risk of explosion is eliminated. Finally, the disclosed chamber is inactive in that no fuel source, ignitors, or flame is required. The turbulence in the air/gas flow causes the pyrophoric gas to react with the air without an induced flame.
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