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Deposition chamber for deposition of particles on semiconductor wafers
Deposition chamber for deposition of particles on semiconductor wafers
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机译:沉积室,用于在半导体晶片上沉积颗粒
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摘要
A deposition chamber for forming a deposited layer on a wafer having a mixing chamber is disclosed having a wafer support device for supporting the wafers in the mixing chamber, a nozzle located above the wafer support device which can eject the gas/particle mixture into the mixing chamber toward the wafer, a gas outlet device at the bottom end of the chamber from the gas nozzle which allows the gas to exit the chamber and a deionizing device located above the wafer support device and below the nozzle to deionize the gas/particle mixture thereby encouraging uniform deposition of the particles on the wafer. This deposition chamber may also comprise an exhaust fan below the gas outlet device.
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