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System and method for producing oscillating magnetic fields in working gaps useful for irradiating a surface with atomic and molecular ions

机译:在工作间隙中产生振荡磁场的系统和方法,可用于用原子和分子离子辐照表面

摘要

Deflection apparatus is shown for high perveance ion beams, operating at 20 Hz fundamental and substantially higher order harmonics, having a magnetic structure formed of laminations with thickness in range between 0.2 and 1 millimeter. Additionally, a compensator is shown with similar laminated structures with resonant excitation circuit, operating at 20 Hz or higher, in phase locked relationship with the frequency of the previously deflected beam. Furthermore, features are shown which have broader applicability to producing strong magnetic field in magnetic gap. Among the numerous important features shown are special laminated magnetic structures, including different sets of crosswise laminations in which the field in one lamination of one set is distributed into multiplicity of laminations of the other set of coil-form structures, field detection means and feedback control system, cooling plate attached in thermal contact with number of lamination layers. Surfaces on the entry and exit sides of the compensator magnetic structure have cooperatively selected shapes to increase the length of path exposed to the force field dependently with deflection angle to compensate for contribution to deflection angle caused by higher order components. The entry and exit surfaces of the magnetic scanner and compensator structures cooperating to produce desired beam profile and desired limit on angular deviation of ions within the beam. Also shown is an accelerator comprising a set of accelerator electrodes having slotted apertures, a suppressor electrode at the exit of the electrostatic accelerator, a post-accelerator analyzer magnet having means for adjusting the angle of incidence by laterally moving the post-accelerator analyzer magnet, and a magnet to eliminate aberration created by the post- accelerator analyzer magnet. In the case of use of a spinning substrate carrier for scanning in one dimension, the excitation wave form of the scanner relates changes in scan velocity in inverse dependence with changes in the radial distance of an implant point from the rotation axis. Also an oxygen implantation method is shown with 50 mA ion beam current, the ion beam energy above 100 KeV, and the angular velocity of a rotating carrier above 50 rpm.
机译:示出了用于高导率离子束的偏转装置,其在20Hz的基波和基本上更高阶的谐波下工作,具有由厚度在0.2至1毫米范围内的叠片形成的磁性结构。另外,示出了具有类似的层叠结构的补偿器,该补偿器具有谐振激励电路,该谐振激励电路在20 Hz或更高频率下与先前偏转光束的频率处于锁相关系。此外,示出了对于在磁隙中产生强磁场具有更广泛的适用性的特征。所示的众多重要特征中包括特殊的叠层磁性结构,包括不同组的横向叠片,其中一组叠片中的磁场分布到另一组线圈形式结构的叠片中,磁场检测装置和反馈控制系统中,冷却板与多层板热接触。补偿器磁性结构的入口和出口侧的表面具有共同选择的形状,以依赖于偏转角增加暴露于力场的路径的长度,以补偿由高阶分量引起的对偏转角的影响。磁性扫描器和补偿器结构的入口和出口表面共同产生所需的电子束轮廓和所需的离子在离子束角度偏差的限制。还显示了一种加速器,该加速器包括一组具有狭缝孔的加速器电极,一个位于静电加速器出口的抑制器电极,一个加速器后分析器磁体,该磁体具有用于通过横向移动该加速器后分析器磁体来调节入射角的装置,磁铁可消除加速器后分析器磁铁产生的像差。在使用旋转的基板载体进行一维扫描的情况下,扫描仪的激励波形使扫描速度的变化与注入点距旋转轴的径向距离的变化成反比关系。还示出了一种氧注入方法,该方法具有50 mA的离子束电流,高于100 KeV的离子束能量以及高于50 rpm的旋转载体角速度。

著录项

  • 公开/公告号US5311028A

    专利类型

  • 公开/公告日1994-05-10

    原文格式PDF

  • 申请/专利权人 NISSIN ELECTRIC CO. LTD.;

    申请/专利号US19920843391

  • 发明设计人 HILTON F. GLAVISH;

    申请日1992-02-28

  • 分类号H01J37/302;H01J37/317;

  • 国家 US

  • 入库时间 2022-08-22 04:31:48

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