Method of producing on silicon, of a micropoint emissive cathodes for flat screen of small dimensions, and products obtained.

摘要

The present invention relates to a process for producing on silicon, of a micropoint emissive cathodes, for a flat display screen of small dimensions, as well as the products obtained by this process. & br / & it consists in making the emissive cathodes from a base substrate (1), monolithic silicon which is formed of a thick layer (300 microns or more), or of a fine layer of a few microns, deposited on an insulating substrate (alumina or glass), the silicon layer being "active" in both cases. & br / it concerns the field of the flat display screens based on the physical phenomenon of cathodoluminescence and the emission of electrons by field effect, and can be applied to all the sectors of industrial use of the display screens or display means of small dimensions, for example, sensors of the video cameras, calculators, apparatuses for controlling all types of vehicles, clock and watch, etc, 1 / p