首页> 外国专利> WAFER-EQUALIZATION PROCESSING AFTER SAW-CUTTING OF DMDS (DIGITAL METHOD MICROMIRROR ELEMENT)

WAFER-EQUALIZATION PROCESSING AFTER SAW-CUTTING OF DMDS (DIGITAL METHOD MICROMIRROR ELEMENT)

机译:DMDS锯切后的晶圆均衡处理(数字方法微量元素)

摘要

PURPOSE: To provide the protecting and fixing equipment and the manufacturing method of the fine mechanism element of a fragile structure manufacture on a wafer. CONSTITUTION: A fixing equipment 26 for protecting at least one fine structure element manufactured on a wafer 22 is prepared and this fixing equipment 26 is provided with at least one upper space 28 on an element for preventing contact with the element, a vacuum port 30 for exhausting connected to this space 28 and a surface with a worked for forming a closely sealed state by the equipment 26 and the wafer 22. In the state of mounting the wafer 22 to the equipment 26 by exhausting the space 28 to vacuum, such influence as breaks the fine mechanism element, the washing operation of a semiconductor chip, e.g. which gives such influence as breaks the fine mechanism element is executed and after completing the operation of them, the element is separated from the wafer 22 to realize the stable manufacture of the fine mechanism element.
机译:目的:提供一种在晶圆上制造脆性结构的精细机构元件的保护和固定设备及其制造方法。构成:准备用于保护至少一个在晶片22上制造的精细结构元件的固定设备26,并且该固定设备26在用于防止与该元件接触的元件上具有至少一个上部空间28,用于防止与该元件接触的真空端口30。连接到该空间28的排气和被加工的表面被设备26和晶片22形成紧密密封状态。在通过将空间28排气到真空而将晶片22安装到设备26的状态下,诸如破坏精细机械元件,例如半导体芯片的清洗操作产生破坏细机构元件的影响,并且在完成它们的操作之后,将该元件与晶片22分离,以实现细机构元件的稳定制造。

著录项

  • 公开/公告号JPH07153823A

    专利类型

  • 公开/公告日1995-06-16

    原文格式PDF

  • 申请/专利权人 TEXAS INSTR INC TI;

    申请/专利号JP19940141871

  • 发明设计人 RICHIYAADO OO GEIRU;MAIKURU EI MIGUNAADEI;

    申请日1994-06-23

  • 分类号H01L21/68;H01L21/301;

  • 国家 JP

  • 入库时间 2022-08-22 04:24:35

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