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process for the realization of metrological structures particularly for the analysis of the accuracy of instruments for measuring alignment on substrates processed.
process for the realization of metrological structures particularly for the analysis of the accuracy of instruments for measuring alignment on substrates processed.
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机译:用于实现计量结构的方法,特别是用于分析用于测量已加工基板对准的仪器精度的方法。
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摘要
process for the realization of metrological structures particularly for the analysis of the accuracy of instruments for measuring alignment on substrates processed the peculiarity of which.ste in metrological structures having profiles of measure carried out on areas of substrate and on areas processed industrially on a single wafer.the profiles of size distributions are detectable with statistical machine to measure for the analysis of accuracy of measurement of the machines themselves.
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