POLYIMIDE COPOLYMERS CONTAINING 4,4'-BIS(P-AMINOPHENOXY) BIPHENYL AND SILOXANE DIAMINE MOIETIES

摘要

A low modulus, solvent resistant, wet etchable polyimideuseful in electronic applications as passivation andinsulating coatings, said polyimides containing a 4,4'-bis(p-aminophenoxy)biphenyl moiety, a siloxane diamine moiety, and adianhydride moiety.