首页> 外国专利> PHOTO-CURING MODELING APPARATUS EQUIPPED WITH OFFSET FUNCTION OF TESSELLATION DATA, AND OFFSET METHOD

PHOTO-CURING MODELING APPARATUS EQUIPPED WITH OFFSET FUNCTION OF TESSELLATION DATA, AND OFFSET METHOD

机译:搭载了Tessellation数据的偏移功能的照片建模装置及偏移方法

摘要

This invention relates to a photo-curing modeling apparatus for modeling a three-dimensional shape by inputting tessellation data defining a three-dimensional shape, calculating a profile data for each section on the basis of the tessellation data and controlling a light irradiation region on the basis of the profile data calculated. This apparatus includes means for storing the tessellation data, means for calculating a normal vector at the apex of each tessellation data, means for judging whether the normal vector calculated has a direction extending along the light irradiation direction or an opposite direction, means for offsetting the coordinates of the apex, which is judged as having the normal vector in the light irradiation direction by the judgement means, in the light irradiating direction, and means for calculating the profile data for each section on the basis of the tessellation data thus offset. The shape before offsetting can be accurately embodied.
机译:光固化建模设备技术领域本发明涉及一种光固化建模设备,该设备用于通过输入定义三维形状的细分数据,基于该细分数据计算每个部分的轮廓数据并控制面板上的光照射区域来对三维形状进行建模。计算出的轮廓数据的基础。该设备包括:用于存储镶嵌数据的装置;用于在每个镶嵌数据的顶点处计算法向矢量的装置;用于判断计算出的法向矢量是沿光照射方向延伸的方向还是与光照射方向相反的方向的装置;由该判断装置判断为在光照射方向上具有法线向量的顶点的座标在光照射方向上的坐标,以及用于基于如此偏移的镶嵌数据计算每个截面的轮廓数据的装置。偏移之前的形状可以精确地体现。

著录项

  • 公开/公告号WO9502500A1

    专利类型

  • 公开/公告日1995-01-26

    原文格式PDF

  • 申请/专利权人 CMET INC.;HAYANO SEIJI;

    申请/专利号WO1993JP00997

  • 发明设计人 HAYANO SEIJI;

    申请日1993-07-15

  • 分类号B29C67/00;B29C35/08;G06F15/60;G03F7/20;B29K105/24;

  • 国家 WO

  • 入库时间 2022-08-22 04:14:54

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