首页> 外国专利> A DENSE, SELF-REINFORCED SILICON NITRIDE CERAMIC PREPARED BY PRESSURELESS OR LOW PRESSURE GAS SINTERING

A DENSE, SELF-REINFORCED SILICON NITRIDE CERAMIC PREPARED BY PRESSURELESS OR LOW PRESSURE GAS SINTERING

机译:通过无压或低压气体烧结制备的致密,自增强硅氮化物陶瓷

摘要

silicon nitrides ceramics prepared by sintering of dense, self reinforced sintering without pressure or the low pressure gas.the composition comprises (a) a silicon azide, with at least 20% are in the form of surface silicon azide beta related to mean high, (b) 2 to 10% by weight of a vitreous phase control of grain containing magnesium oxide, oxide yttrium, silicon dioxide, and optionally zirconia.an oxide selected from the group consisting of calcium oxide, gallium, indium, and hafnium, and (c) a second crystalline phase in a quantity of between 0.5 and 5.0% by weight of zirconium oxide, and (d) of the crystal phases of zirconium silicide mu00e9talliqu e and / or zirconium silicon metal azide in a combined total of between 0.1 and 3.0% by weight, in which the metal is calcium, tantalum, hafnium, gallium or indium, and when the metal is calcium, hafnium, gallium or indium, a metal is in the form of a metal oxide in the glass phase.the ceramic has a high strength and a toughness fracture, it has a density of at least 98% of theoretical.
机译:氮化硅陶瓷,是通过在无压力或低压气体的条件下烧结致密,自增强烧结而制得的。该组合物包含(a)叠氮化硅,其中至少20%为表面叠氮化硅的形式,与平均硅含量高有关,( b)含氧化镁,氧化钇,二氧化硅和任选的氧化锆的颗粒的玻璃相控制的2-10%重量。选自氧化钙,镓,铟和ha的氧化物,以及(c )含量为氧化锆重量的0.5%至5.0%的第二晶相,以及(d)硅化锆和/或锆硅金属叠氮化物的晶相,合计总量为0.1%和3.0重量%,其中金属是钙,钽,ha,镓或铟,并且当金属是钙,ha,镓或铟时,金属在玻璃相中为金属氧化物的形式。陶瓷具有高强度和韧性因此,它的密度至少为理论值的98%。

著录项

  • 公开/公告号EP0572484B1

    专利类型

  • 公开/公告日1994-11-30

    原文格式PDF

  • 申请/专利权人 DOW CHEMICAL CO;

    申请/专利号EP19920905364

  • 发明设计人 PYZIK ALEKSANDER J.;

    申请日1992-01-06

  • 分类号C04B35/58;

  • 国家 EP

  • 入库时间 2022-08-22 04:14:17

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