Patent application title: METHOD FOR OPENING AIR IN Pneumatic Equipment of Semiconductor Manufacturing Apparatus, Gas Supply Apparatus and Flue Gas Treatment Apparatus

摘要

The present invention relates to a method for preventing corrosion of the inner wall of a pneumatic device and adverse effects on the human body when opening the inside of a pneumatic device such as a semiconductor manufacturing apparatus or its peripheral device for performing etching, CVD, The composition is such that an inert gas is introduced into a pneumatic device such as a chamber or a pipe through which an interhalogen compound gas flows, and then the inert gas is introduced into the chamber. Thereafter, a gas having a humidity of more than 1% is introduced into the chamber, The concentration of the interhalogen compound gas in the chamber or the like decreases to such an extent that the inner wall of the chamber or the like is not corroded before introducing the gas having humidity into the chamber or the like and then the gas having a humidity of more than 1% For example, ClF₃Gas) is decomposed into a substance having low toxicity such as HF and low adsorption to the inner wall of the chamber, and then the inside of the chambers is opened to the atmosphere, thereby preventing the chamber from being adversely affected by corrosion or the human body.