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Side electric current injection die quantum well semiconductor laser component

机译:侧电流注入模量子阱半导体激光器组件

摘要

PURPOSE:To provide a quantum well type semiconductor laser element, which has a low threshold current, is oscillative continuously at room temp., and easily manufacturable, by forming quantum well structure, wherein a quantum well layer is pinched by barrier layers, through a single growth of semiconductor layer by MBE method, and forming different electroconductive type within the quantum layer in quantum well structure. CONSTITUTION:Using a substrate 10 of III-V compound, in which a semiconductor growing surface 11 with mirror index at (n11)A-plane (n is integer and A is group III element surface), and a growing surface 12 having different mirror index from the first named growing surface 11 are arranged adjoiningly, a III-V compound semiconductor using group IV amphoteric element as dopant is grown both on these growing surface 11, 12 simultaneously by the MBE method. Thus a semiconductor layer 21 formed on the growing surface 11 of (n11)A is in p-type, while a semiconductor layer 22 formed on the other growing surface 12 is in n-type, and a p-n joint surface 23 is formed between them. Accordingly on the growing surfaces 11, 12 of the substrate 10 a quantum well structure is formed, wherein a clad layer, quantum well layer, and barrier layer are laminated alternately by III-V compound semiconductor, and p-n joint in the quantum well structure by forming clad layer one after another. This improves different activenesses of laser.
机译:目的:提供一种具有低阈值电流的量子阱型半导体激光器元件,该激光器元件通过形成量子阱结构而在室温下连续振荡,并且易于制造,其中量子阱层通过势垒层被势垒层夹住。通过MBE法单层生长半导体层,并在量子阱结构的量子层内形成不同的导电类型。构成:使用III-V族化合物衬底10,其中半导体生长表面11的镜面折射率在(n11)A平面(n是整数,A是III族元素表面),且生长面12的镜面不同从第一个生长表面11开始,以MBE法在两个生长表面11、12上同时生长以IV族两性元素为掺杂剂的III-V族化合物半导体。因此,形成在(n11)A的生长表面11上的半导体层21是p型的,而形成在另一个生长表面12上的半导体层22是n型的,并且在它们之间形成了pn接合面23。 。因此,在基板10的生长表面11、12上形成量子阱结构,其中,包覆层,量子阱层和势垒层通过III-V族化合物半导体交替层叠,并且在量子阱结构中通过pn接合形成。一层又一层地形成覆层。这改善了激光的不同活性。

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