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POLYIMIDE BUMP AND SEMICONDUCTOR ELEMENT MOUNTING BUMP, MANUFACTURE OF THEM AND POLYIMIDE BUMP TESTING METHOD

机译:聚酰亚胺碰撞和半导体元件安装碰撞,其制造和聚酰亚胺碰撞测试方法

摘要

PURPOSE: To form a polyimide bump generating no fatigue failure at the base by grooving the head top of a polyimide bump on an electrode pad. ;CONSTITUTION: A polyimide bump 5 30μm in diameter and 30μm high is formed leaving a polyimide 4' on an Al pad 3 by developing and curing the polyimide 4', and then a groove 6 with an X head top of polyimide bump 5 is moved down. The groove 6 is 10μm deep and 3μm wide. On the polyimide bump 5 of the above-mentioned constitution, when it is connected using a substrate 8 and solder 9 after the outside surface, including the inside surface of the groove 6, has been covered by an Al and Ti/Cu conductive film 7, the air when solder is fused does not remain in the concavity 10 in head top of the bump, and the air is absorbed to the groove 6. Also, as fused solder 9 intrudes into the groove 6, the surface area of junction of soldering is increased. As a result, junction strength is increased, stabilized and reliability can be enhanced.;COPYRIGHT: (C)1996,JPO
机译:目的:形成一个聚酰亚胺凸块,通过在电极垫上刻槽一个聚酰亚胺凸块的头部顶部,在基座上不会产生疲劳破坏。 ;构成:通过显影和固化聚酰亚胺4',形成直径为30μm,高为30μm的聚酰亚胺凸块5,将聚酰亚胺4'留在Al焊盘3上,然后移动带有X头的聚酰亚胺凸块5的凹槽6下。凹槽6的深度为10μm,宽度为3μm。在具有上述结构的聚酰亚胺凸块5上,当使用凹槽8和Ti / Cu导电膜7覆盖包括凹槽6的内表面的外表面之后,使用基板8和焊料9将其连接时。因此,焊料熔化时的空气不会残留在凸块的顶部顶部的凹部10中,并且空气被吸收到凹槽6中。此外,当熔化的焊料9侵入凹槽6中时,焊接接合的表面积。增加。结果,结强度得以增加,稳定并可以提高可靠性。;版权所有:(C)1996,日本特许厅

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