PURPOSE:To contrive reduction in the period of time required for a vapor drying work process by a method wherein a cartridge is heated up using an inflared ray lamp heater separately from the heating with a vapor atmosphere. CONSTITUTION:The organic solvent 6 stored at the bottom part of a vapor chamber 3 is heated up and evaporated, vapor is generated, and the chamber 3 is brought into a vapor atmosphere completely. At this time, the cartridge wherein a plurality of wafers 12 are housed is suspended at the prescribed position on a tray 9 in the chamber 3. Said cartridge is heated up in a non- contact state with an inflared ray lamp heater 13. When the cartridge and the wafers, which were moisened by water, are placed in the vapor atmosphere, the vapor is on and adhered to the surface of the cartridge and the wafers through dew condensation. The moisture with which the surface of the wafers is gradually replaced with the dew-condensed organic solvent, and said replacement is completed when the surface temperature of the cartridge and the like is made equal to the temperature of the vapor. The period of wafer-drying work can be cut down by heating the cartridge with the heater 13.
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