首页> 外国专利> APPARATUS AND METHOD FOR TEMPERATURE CONTROL OF WOAPPARATUS AND METHOD FOR TEMPERATURE CONTROL OF WORKPIECES IN VACUUM RKPIECES IN VACUUM

APPARATUS AND METHOD FOR TEMPERATURE CONTROL OF WOAPPARATUS AND METHOD FOR TEMPERATURE CONTROL OF WORKPIECES IN VACUUM RKPIECES IN VACUUM

机译:真空中的装置的温度控制装置和方法以及真空中的制品的温度控制方法

摘要

A flat workpiece (2) is placed in contact with a flat platen in a vacuum chamber, and is held by a uniformly-distributed force while a small mass flow of gas is introduced along a contour (203) to form a uniform pressure region between the flat workpiece (201) and the platen (2). Separation of the two surfaces due to surface roughness is less than the gas mean free path, and high rates of heat transfer are obtained uniformly over the area of the workpiece (2). A scavenging port (207), located outwardly of the gas introduction contour (203) is differentially pumped to reduce the rate of gas leakage into the chamber. Pressure is provided by an electrostatic clamp (250) where the voltage activation sequence prevents workpiece vibration. A clamping current sensor immediately detects degree of contact, e.g., due to debris on the platen, and initiates a suitable warning or control.
机译:将平坦的工件(2)放置在真空室中与平坦的压盘接触,并通过均匀分布的力保持,同时沿轮廓(203)引入少量的气体流以在两者之间形成均匀的压力区域平工件(201)和压盘(2)。由于表面粗糙度而导致的两个表面的分离小于气体平均自由程,并且在工件(2)的整个区域内均匀地获得了较高的热传递率。位于气体引入轮廓(203)外部的扫气口(207)被差分泵送,以减少气体泄漏到腔室中的速率。压力由静电夹具(250)提供,电压激活顺序可防止工件振动。夹紧电流传感器会立即检测到例如由于压板上的碎屑引起的接触程度,并发出适当的警告或控制。

著录项

  • 公开/公告号WO9613058A3

    专利类型

  • 公开/公告日1996-06-27

    原文格式PDF

  • 申请/专利权人 DIAMOND SEMICONDUCTOR GROUP INC.;

    申请/专利号WO1995US13158

  • 发明设计人 WHITE NICHOLAS R.;

    申请日1995-10-17

  • 分类号H01L;

  • 国家 WO

  • 入库时间 2022-08-22 03:48:55

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