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Transparent, electrically-conductive, ion-blocking layer for electrochromic windows

机译:用于电致变色窗的透明导电离子阻挡层

摘要

Transparent, electrically-conductive, ion-blocking layers suitable for use in electrochromic windows. Preferably, one such layer is interposed between the electrochromic layer and its adjacent electron- conductive layer, and another such layer is interposed between the counter-electrode layer and its adjacent electron-conductive layer. Each of the transparent, electrically-conductive, ion-blocking layers comprises an n-type lithium- doped silicon carbide thin film formed by rf diode sputtering. In addition to being suitable for use in electrochromic windows, the n-type lithium-doped silicon carbide thin films of the present invention may also be used in a variety of electronic devices and may be combined, for example, with p-type silicon carbide films, either doped or undoped, in various p-n junction devices, such as LED's, high temperature diodes, etc.
机译:适用于电致变色窗的透明导电离子阻挡层。优选地,一个这样的层插入在电致变色层与其相邻的电子导电层之间,并且另一个这样的层插入在反电极层与其相邻的电子导电层之间。每个透明导电离子阻挡层包括通过射频二极管溅射形成的n型掺杂锂的碳化硅薄膜。除了适用于电致变色窗之外,本发明的n型掺杂锂的碳化硅薄膜还可以用于各种电子设备中,并且可以与例如p型碳化硅结合使用。在各种pn结器件中掺杂或未掺杂的薄膜,例如LED,高温二极管等。

著录项

  • 公开/公告号US5532869A

    专利类型

  • 公开/公告日1996-07-02

    原文格式PDF

  • 申请/专利权人 TUFTS UNIVERSITY;

    申请/专利号US19940235255

  • 发明设计人 RONALD B. GOLDNER;SEMYON SLAVEN;

    申请日1994-04-29

  • 分类号G02F1/153;

  • 国家 US

  • 入库时间 2022-08-22 03:38:21

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