And the method Sousei of doing the atmosphere which is controlled inside the field emission device by using the gettering substance at the same time keeping

摘要

(57) Abstract Inside FED, there is no oxidation gas with respect to essence, at the same time Sousei to do the atmosphere which furthermore 10^-7 - 10^-3 includes hydrogen by pressure of the millibar range and is controlled and inside FED, before that frit sealing, to arrange the gettering substance which beforehand loads the gaseous hydrogen to a method in order to keep, the frit to seal two components which next form FED according to around that, FED itself during this operation or after that, through the tail which is arranged appropriately, exhaust do, to include the processes which are closed with welding feature and with after tip/chip off the exhaust, furthermore the aforementioned gettering substanceBy disclosing to the gaseous hydrogen by pressure of 10^-4 - 2 bar/var ranges hydrogen the method of loading.