a device for manipulation of a synchrotronstrahlenbu00fcndels to the relevant application for the ru00f6ntgentiefenlithographie, especially the scanregime adapted strahlenbu00fcndeleigenschaften under vacuum conditions is provided.according to the invention are $a in a vacuum chamber, a to a synchrotronstrahlenbu00fcndel in a scanbewegung adjustable objekttisch to include an object to be irradiated contains, between the objekttisch and a eintrittsfenster couples move against each other for the blind, which the couplewhen the direction of the mutual verschiebbarkeit the apertures with the scanbewegung coincides to the scanbewegung is coupled. the vacuum chamber is also a filterkammer prior to the synchrotronstrahlenbu00fcndel einschaltbare preventers.$a the invention is for use in and for the ru00f6ntgentiefenlithographie planned to produce the technical components of microsystems under the name of league process (lithography with synchrotron radiation, galvanoformung abformtechnik plastics) known technology is used.
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