Electronic bi - mu lighting device

摘要

PURPOSE:To enable irradiations of an electron beam and ion beam to be made concurrently also in the approximately same crystal orientation by providing an electrostatic prism system in an ion-beam irradiation mechanism in a housing of a main body of an electron beam irradiation device. CONSTITUTION:An electrostatic prism system 2 in an ion-beam irradiation mechanism is made to locate in a main body of an electron beam irradiation device. Therefore, the ion beam can be deflected in any angle by the electrostatic prism system 2 in the main body of the electron beam irradiation device. Thus enables an irradiation angle between the ion beam and electron beam to be selected in a range of 0-90 deg. by selecting the electrostatic prism system 2, also an electric current of the ion-beam irradiating a sample 7 can be detected near the sample, and thereby a correcter detection than before can be obtained.