首页> 外国专利> Protection of the surfaces of building materials of monuments, statues, sculptural decoration, inscriptions, polychromes, murals, pictures and new buildings from the effect of atmospheric pollutants by coating with a new system of semiconductors produced by a new method as pigments in reversible polymers.

Protection of the surfaces of building materials of monuments, statues, sculptural decoration, inscriptions, polychromes, murals, pictures and new buildings from the effect of atmospheric pollutants by coating with a new system of semiconductors produced by a new method as pigments in reversible polymers.

机译:通过涂覆以新方法生产的半导体新体系作为可逆聚合物中的颜料,保护纪念碑,雕像,雕塑装饰,铭文,彩绘,壁画,图片和新建筑等建筑材料的表面免受大气污染物的影响。

摘要

The invention consists of protection by dressing or spraying the surfaces of building materials of monuments, new buildings, statues, sculptural decoration, inscriptions, polychromes, murals and pictures from attack by atmospheric pollutants: acid rain, sulphuration (gypsum formation) and deposits of suspended particles with a solution of preferably reversible (re-soluble) polymers that contain a semiconductor. Thus the invention consists of dressing or spraying the above surfaces with a solution of a reversible polymer that contains an n-semiconductor such as: Al2O3, Al(OH)3, TiO2, Ti(OH)4, Fe2O3, Fe(OH)3 etc., characterized as MxOyHz (where x=1,2,3, y=1,2,3,4 and z=0,1,2,3,4) plain or doped with, for example, MgO or other substances and of a cheap and improved method for preparation of such semiconductors. The final ratio of solid polymer:n-semiconductor = 98- 50:2-50. The method for preparation of these semiconductors consists of precipitation of the hydroxides of the metals with 0.001 to 1M alkali solutions from 0.001 to 1M aqueous solutions of any of their salts, filtration and washing with deionized or distilled water until the anions of the original salts are completely removed (testing with an appropriate reagent), drying of the hydroxides at 40 degree - 110 degree C, firing at 400 degree - 900 degree C to convert them to the oxide (if they are to be used as such and not as the hydroxide) and grinding. To prepare mixtures (doped) of the same n-semiconductors, any salt of magnesium or another metal is added to the initial solution of salts in a final ratio of: MxOyHz: (e.g.) MgO or Mg(OH)2 = 1-5:1-0.3. Measurement of the electrical resistance of the powder is carried out to test intensity of the n-semiconductivity. The n-semiconductor prepared by this method is then added to a solution of, preferably, a reversible (re-soluble) polymer as above and the resulting mixture used to dress or spray the surface for protection. Other than the considerable protection of the above surfaces against atmospheric attack offered by the addition of the semiconductor (pure or doped) it also leads to the surfaces being protected from cracking from corrosion with mechanical fatigue and protection by the polymers from ultraviolet radiation and repulsion of suspended particles and micro-organisms. The semiconductors are not consumed as materials nor are their n-semiconducting properties exhausted.
机译:本发明包括通过对纪念碑,新建筑物,雕像,雕塑装饰,铭文,彩绘,壁画和图片等建筑材料的表面进行修整或喷涂来保护其免受大气污染物的侵蚀:酸雨,硫化(石膏形成)和悬浮沉积物含有可逆的(可再溶的)聚合物溶液的半导体颗粒。因此,本发明包括用可逆聚合物溶液修整或喷涂上述表面,该可逆聚合物溶液包含n半导体,例如:Al 2 O 3,Al(OH)3,TiO 2,Ti(OH)4,Fe 2 O 3,Fe(OH)3。等,特征为MxOyHz(其中x = 1,2,3,y = 1,2,3,4和z = 0,1,2,3,4)是普通的或掺杂有MgO或其他物质以及一种廉价且改进的用于制备这种半导体的方法。固体聚合物:n-半导体的最终比率= 98-50:2-50。这些半导体的制备方法包括用0.001-1M的碱溶液从0.001-1M的任何盐的水溶液中沉淀金属的氢氧化物,过滤并用去离子水或蒸馏水洗涤,直到原始盐的阴离子被完全除去(用适当的试剂进行测试),在40度至110度的温度下干燥氢氧化物,在400度至900度的温度下烧成,将其转化为氧化物(如果直接使用而不是用作氢氧化物) )和研磨。为了制备相同n半导体的混合物(掺杂),将镁或另一种金属的任何盐以以下最终比率添加到盐的初始溶液中:MxOyHz :(例如)MgO或Mg(OH)2 = 1-5 :1-0.3。进行粉末电阻的测量以测试n-半导电性的强度。然后将通过该方法制备的n半导体添加至优选地如上所述的可逆(可再溶)聚合物的溶液中,并将所得混合物用于修整或喷涂表面以进行保护。除了通过添加半导体(纯的或掺杂的)对上述表面提供相当大的保护,使其免受大气侵蚀外,还可以保护表面免受机械疲劳腐蚀的开裂和聚合物的紫外线辐射和排斥的保护。悬浮颗粒和微生物。半导体不作为材料消耗,也不耗尽其n半导体性能。

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