首页> 外国专利> PROCESS FOR MANUFACTURING AND CALIBRATING A RULER IN THE NANOMETRE RANGE FOR TECHNICAL APPARATUSES THAT ARE USED FOR HIGH-RESOLUTION OF ULTRA-HIGH RESOLUTION IMAGING OF STRUCTURES

PROCESS FOR MANUFACTURING AND CALIBRATING A RULER IN THE NANOMETRE RANGE FOR TECHNICAL APPARATUSES THAT ARE USED FOR HIGH-RESOLUTION OF ULTRA-HIGH RESOLUTION IMAGING OF STRUCTURES

机译:在纳米技术范围内制造和校准标尺的过程,该标尺用于高分辨率的结构超高分辨率成像

摘要

1.1 A Process for Manufacturing and Calibrating a Ruler in the Nanometre Range for Technical Apparatuses that are Used for High-resolution or Ultra-high Resolution 2.1 The present invention describes the production and calibration of a ruler used to calibrate the above stated technical apparatuses. 2.2 At least two different crystalline or amorphous materials are used to construct the ruler; these should differ appropriately from each are in their contrast during imaging. These layers of material are deposited as a sequence of heterolayers on a carrier material, using a suitable material deposition process. The heterolayer sequence that is produced is described experimentally with at least one analytical method that is sensitive to the individual layer thicknesses of the heterolayer sequence. The data obtained by the analytical method are evaluated and recorded. By separating the heterolayer sequence in the direction of deposition, it is possible to render the layer structure visible. 2.3 The solution according to the present invention is suitable, in particular, for calibrating technical apparatuses that are used in raster electron microscopy, transmission electron microscopy, or raster probe microscopy (raster power microscopy, raster tunnel microscopy. 3.0 Figure 1.
机译:1.1用于高分辨率或超高分辨率的技术设备的纳米范围内标尺的制造和校准方法2.1本发明描述了用于校准上述技术设备的标尺的生产和校准。 2.2至少使用两种不同的晶体或无定形材料来构造标尺;在成像过程中,它们的对比度应适当不同。使用合适的材料沉积工艺,将这些材料层作为一系列异质层沉积在载体材料上。通过至少一种对异层序列的各个层厚度敏感的分析方法,以实验方式描述了所产生的异层序列。评估并记录通过分析方法获得的数据。通过沿沉积方向分离杂层序列,可以使层结构可见。 2.3根据本发明的解决方案尤其适用于校准在光栅电子显微镜,透射电子显微镜或光栅探针显微镜(光栅功率显微镜,光栅隧道显微镜)中使用的技术设备。3.0图1。

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