首页>
外国专利>
Method and apparatus for characterising multilayer thin film systems and for measuring the distance between two surfaces in the presence of thin films
Method and apparatus for characterising multilayer thin film systems and for measuring the distance between two surfaces in the presence of thin films
展开▼
机译:用于表征多层薄膜系统并在存在薄膜的情况下测量两个表面之间的距离的方法和装置
展开▼
页面导航
摘要
著录项
相似文献
摘要
A method and apparatus are disclosed for characterising a one or more layer thin film system on a substrate, in particular in respect of layer thickness and refractive index, and for measuring the distance between two surfaces, wherein at least one of the surfaces comprises a one- or multi-layer system, taking into account, and allowing rectification of, the phase contribution from the thin film stack, by interferometry, in particular by white-light channelled spectrum interferometry or multi-wavelength interferometry.
展开▼