Gas gauge connection structure of chemical process equipment

摘要

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to cleaning equipment during semiconductor device manufacturing processes, and more particularly, to a connecting structure of gauges for measuring the amount of gas exhausting harmful gases generated during wet cleaning of wafers.;In the conventional method of connecting the displacement measuring gauge and the tube, the tube is forcibly extended by applying heat and connected to the connection portion of the gauge, so that the connection portion thereof is damaged due to hardening over time, resulting in a leak of gas. There was a problem that the measurement of.;The present invention is to overcome the above problems, in the connection structure for connecting the discharge gauge to the tube in the duct for discharging the chemical gas generated in the cleaning process during the semiconductor device manufacturing process, one end of the tube on one side of the gauge Including the connecting means for inserting and connecting the predetermined length, leakage of the exhaust gas due to a defect in the connecting portion of the tube is prevented from occurring, so that accurate exhaust gas amount measurement can be performed.