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photostrukturierbare coatings based on a hydrogen silsesquioxanharzes
photostrukturierbare coatings based on a hydrogen silsesquioxanharzes
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机译:基于氢硅倍半氧烷的光固化机涂料
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摘要
The present invention relates to a method of forming patterned coatings on substrates, especially electronic devices, by negative resist techniques. The method comprises applying a preceramic coating comprising hydrogen silsesquioxane resin and an initiator onto the substrate and then radiating a selected region of the coating for a time sufficient to cure the resin. The uncured coating is then rinsed away leaving the patterned coating.
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