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Sub-micron through-the-lens positioning utilizing out of phase segmented gratings
Sub-micron through-the-lens positioning utilizing out of phase segmented gratings
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机译:利用异相分段光栅进行亚微米透镜定位
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摘要
Through-the-lens alignment during deep UV lithographic processing in the manufacture of VLSI is accomplished without shifting the mask or wafer from the exposure position. Introduction and extraction of alignment light of actinic wavelength depends on beam routing due to diffraction from an interference grating. The path of alignment light is within the focusing system but does not impinge on the focused pattern.
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