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METHOD FOR REMOVING DIFFUSED FILM FROM NICKEL BASE ALLOY

机译:镍基合金中弥散膜的去除方法

摘要

PROBLEM TO BE SOLVED: To provide a method for removing a diffused film contg. Al from the surface part of an Ni base alloy. ;SOLUTION: The outer parts of the film existing on the diffused inner parts of the film are mechanically removed and, thereafter, Al is decreased from the diffused inner parts exposed on the surface. Such decrease is executed by exposing the inner parts to a reducing gas contg. about 6wt.% or over of gaseous halogen. The reducing gas is a mixture composed of, for example, about ≤20wt.% gaseous hydrogen halide (for example, gaseous hydrogen fluoride) and the balance gaseous hydrogen. The exposure temp. is about ≥1600°F and the exposure time is preferably about 2 to 10 hours at about 1600 to 2000°F.;COPYRIGHT: (C)1998,JPO
机译:要解决的问题:提供一种去除扩散膜的方法。镍基合金表面的Al。 ;解决方案:将存在于薄膜扩散内部的薄膜外部机械去除,然后从表面上暴露的扩散内部减少Al。通过使内部暴露于还原性气体contg来执行这种减少。约6wt。%或以上的气态卤素。还原气体是由例如约≤20wt。%的气态卤化氢(例如,气态氟化氢)和其余气态氢组成的混合物。曝光温度大约在1600°F左右,暴露时间在1600到2000°F左右最好是2到10个小时;版权:(C)1998,JPO

著录项

  • 公开/公告号JPH1072685A

    专利类型

  • 公开/公告日1998-03-17

    原文格式PDF

  • 申请/专利权人 GENERAL ELECTRIC CO GE;

    申请/专利号JP19970157268

  • 发明设计人 REVERMAN JEFFREY JOHN;

    申请日1997-06-16

  • 分类号C23F4/00;F01D5/28;

  • 国家 JP

  • 入库时间 2022-08-22 03:06:12

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