CLEANING APPARATUS FOR REACTION VESSEL, CHEMICAL-SPRAYING APPARATUS FOR REACTION VESSEL, AND NOZZLE FOR REACTION VESSEL

摘要

PROBLEM TO BE SOLVED: To provide a cleaning/chemical-spraying apparatus which can be installed in a reaction vessel and can be prevented from clogging due to reaction products of polymn. residues, etc. ;SOLUTION: This apparatus has a nozzle 10 installed in a reaction vessel 12, a cleaning-soln. supply means for supplying a cleaning soln. to the nozzle 10, and a chemical supply means for supplying a chemical, such as a deposition preventive for polymn. residues, to the nozzle 10. The internal channel of the nozzle 10 has a sealing liq. space capable of storing a liq. at the vicinity of a discharge port 34, and the nozzle 10 has a pressure-equalizing route 36 communicating the internal channel with the nozzle outside at a position higher than the sealing liq. space. Thus, the internal channel of the nozzle 10 is isolated from the inside of the reaction vessel 12 by a sealng liq., and hence the nozzle is not clogged by polymn. residues.;COPYRIGHT: (C)1998,JPO