The manner null which restores the phase-shift defect of the phase-shift mask

摘要

PURPOSE: To repair a phase shift defect of a phase shift mask by attaching a transparent material from a gaseous precursor on the defect by irradiation with UV ray beams. CONSTITUTION: The phase shift mask has a transparent substrate 2 made of a transparent material such as qurtz, 'Pyrex(R)', or other transparent materials, an opaque material 4 made of a material such as chromium or gold and a phase shift layer 6 placed on the substrate 2. There is a gap type defect 8 on the phase shift layer 6. The defect 8 is repaired by attaching the transparent material on the defect by irradiation with UV ray beams. The material to be used is a gaseous precursor material which is dissociated (decomposed) by irradiation with UV rays and is deposited on the defect 8 to form a solid transparent material. As the adequate gaseous precursor, chromium hexavalent carbonyl, silicon quadrivalent alkoxide and aluminum trivalent alkoxide are preferable. UV ray beams generated by an excimer laser are preferably used.