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Method and apparatus for forming patterns in a photosensitive resin layer by continuous laser exposure, use for the fabrication of electron sources comprising emissive cathodes with microtips and flat display screens
Method and apparatus for forming patterns in a photosensitive resin layer by continuous laser exposure, use for the fabrication of electron sources comprising emissive cathodes with microtips and flat display screens
The process for forming an image within a photosensitive layer (22) of resin includes the formation of several elementary light beams whose axes are parallel. The light beams are then arranged to move relative to the photosensitive layer at a constant speed and maintaining a constant optical power, the beams being focussed (41) on to the layer. This has the effect of exposing parallel lines on the layer, with the speed and intensity chosen so that each line receives a dose of radiation less than that required for development of the photosensitive resin. The assembly of light beams is then rotated by a predetermined angle w.r.t. the photosensitive layer and the translation and irradiation repeated. The speed and intensity are such as to give a dose of radiation equal to the difference between the first dose and that required for development, such that only the intersections of the lines receive the full development dose. The resin is then developed forming a design based on this intersection pattern.
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