首页> 外国专利> Method and apparatus for forming patterns in a photosensitive resin layer by continuous laser exposure, use for the fabrication of electron sources comprising emissive cathodes with microtips and flat display screens

Method and apparatus for forming patterns in a photosensitive resin layer by continuous laser exposure, use for the fabrication of electron sources comprising emissive cathodes with microtips and flat display screens

机译:通过连续激光曝光在光敏树脂层中形成图案的方法和设备,用于制造电子源,该电子源包括带有微尖端的发射阴极和平面显示屏

摘要

The process for forming an image within a photosensitive layer (22) of resin includes the formation of several elementary light beams whose axes are parallel. The light beams are then arranged to move relative to the photosensitive layer at a constant speed and maintaining a constant optical power, the beams being focussed (41) on to the layer. This has the effect of exposing parallel lines on the layer, with the speed and intensity chosen so that each line receives a dose of radiation less than that required for development of the photosensitive resin. The assembly of light beams is then rotated by a predetermined angle w.r.t. the photosensitive layer and the translation and irradiation repeated. The speed and intensity are such as to give a dose of radiation equal to the difference between the first dose and that required for development, such that only the intersections of the lines receive the full development dose. The resin is then developed forming a design based on this intersection pattern.
机译:在树脂的光敏层(22)内形成图像的方法包括形成多个基本轴平行的基本光束。然后将光束布置成以恒定速度相对于感光层移动并保持恒定的光焦度,将光束聚焦(41)到该层上。这具有将平行线暴露在层上的效果,并选择了速度和强度,以使每条线接收的辐射剂量小于光敏树脂显影所需的辐射剂量。然后将光束组件旋转预定角度w.r.t。再次进行光敏层的平移和照射。速度和强度使辐射剂量等于第一剂量与显影所需剂量之间的差,从而只有线条的交点才能接收到完整的显影剂量。然后使树脂显影,从而形成基于该相交图案的设计。

著录项

  • 公开/公告号EP0822569A1

    专利类型

  • 公开/公告日1998-02-04

    原文格式PDF

  • 申请/专利权人 COMMISSARIAT A LENERGIE ATOMIQUE;

    申请/专利号EP19970401797

  • 发明设计人 IDA MICHEL;RABAROT MARC;

    申请日1997-07-25

  • 分类号H01J9/02;G03F7/20;

  • 国家 EP

  • 入库时间 2022-08-22 02:49:46

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